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Current Course Research Interests

Current Course Publications
Current Course Team Singh


Research Interests:

The Singh group explores a wide variety of different materials research areas, including: 

  • Chemical Mechanical Planarization of metals (Cu, Ta etc.), dielectrics, wide band gap semiconductors and other emerging materials
  • Wide band gap semiconductor (III-V Nitrides, SiC) material processing 
  • Light emitting devices, phosphors and flat panel displays 
  • Laser processing, thin films; transient thermal phenomena; superconducting and dielectric(low K and high K) thin films; diamond and related materials, particulate coatings;semiconductor processing; oxide thin films & electronics, amorphous silicon
  • Nanoparticle synthesis and processing
  • Battery materials and thin film batteries
Facilities:

  1. This system is an Electron-Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD) chamber which we have used in research related to diamond and other carbon-based thin films, low-K dielectrics, and other thin films. This system uses a 2.45 GHz microwave source and a ring of rare earth magnets to create a plasma which is used to break down gaseous precursors and deposit films onto a variety of substrates.
ECR-PECVD
  1. This is a look inside our ultraviolet-enhanced pulsed laser deposition (UV-PLD) chamber. This system is capable of ultra high vacuum (UHV) conditions and is used for pulsed laser deposition (PLD) of thin oxide films. The system has also been fitted with an ultraviolet light source for in-situ photo assisted PLD, and has the capability for multiple ablation targets which facilitates fabrication of multilayered films.. 

  1. This is our CV/IV system. It is used to measure the electrical quality, dielectric constants, and leakage currents of the thin films we make in the lab. It also has a heated stage which gives the capability of measuring film properties as a function of temperature


  1. We have two high temperature Lindberg furnaces with vacuum pumps for low pressure thermal processing of materials. The samples can also be treated under different ambient conditions. 

Singh group members extensively use
  • Nanoscale Research Facility for semiconductor processing e.g. sputtering, reactive ion etching, lithography and rapid thermal processing etc.
  • Particle Science and Engineering Center for material and particle characterization e.g. particle size measurements, zeta potential measurements, FTIR etc.
  • Major Analytical and Instrumentation Center for thin film and powder XRD, AFM, TEM, SEM, XPS, Auger Spectroscopy etc. 

S.L.I.M. Laser Simulation Software:

Dr. Singh has written a program called S.L.I.M. (Simulation of Laser Interactions with Matter). This program can be used to simulate the thermal effects of laser beam interactions with any target of known composition, based on input parameters provided by the user. Below is a link to a Winzip archive which contains the demo version of the program. To download the S.L.I.M. demo, click the link below and choose "save file" from the menu that appears. Once you have downloaded the file "SLIMdemo.zip" you can use Winzip to extract the three files provided. Please open and read the file named "readme.txt" first for instructions.

SLIMdemo.zip


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Last Update:   Monday, February 28, 2000


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